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Electron microscopy systems
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Anisotropic etching parallel plate plasma etcher
Designed for removal of passivation layer from an electronic device, and when the lines are below a certain point in width, such that undercutting with isotropic etching undercuts the lines completely
News from SPI Supplies ( 5 January 2006)
Osmium coating for electron microscopy
SPI Supplies is the worldwide distributor (outside of Japan) for the line of OPC Osmium Plasma Coaters manufactured by Filgen, an important and respected scientific instrument manufacturer in Japan
News from SPI Supplies ( 4 January 2006)
MRam manufacturers turning towards laser 3DAP
Developers of magnetoresistive random access memory are taking a interest in the Laser Three Dimensional Atom Probe from Oxford Nanoscience to show atomic level structure in these complex devices
News from Oxford Nanoscience (22 December 2005)
Molecular imaging acquired by Agilent
Acquisition marks the next step in strengthening Agilent's market position in nanomeasurement by extending its portfolio into imaging at the nanometer scale through atomic force microscopes (AFMs)
News from Molecular Imaging (30 November 2005)
New secondary electron detector for S-3400N
Hitachi High-Technologies has introduced a new environmental secondary electron detector (ESED) for the S-3400N variable pressure scanning electron microscope
News from Hitachi High-Technologies (14 November 2005)
Greater sampling volume for 3D atom probe
Field of view has been increased by approximately 2.5 times compared to previous versions of the instrument, without sacrificing mass resolution
News from Oxford Nanoscience (14 November 2005)
3DAP wins another award
Three-Dimensional Atom Probe (3DAP) from Oxford Nanoscience has been announced as the winner of the product category of the annual Nano 50 Awards, presented by Nanotech Briefs magazine
News from Oxford Nanoscience (25 October 2005)
TEM demonstration system in the UK
Hitachi High-Technologies has announced that the H-7650 ultra-high sensitivity digital imaging TEM is available for demonstration at its Wokingham demonstration unit from the end of September 2005
News from Hitachi High-Technologies (11 October 2005)
Scanning atom probe is under development
Technical background article Next-generation instrument, developed through a DTi-funded Link project, will be used to correlate microstructural properties of the thin films with magnetic and transport device-level performance
News from Oxford Nanoscience ( 7 September 2005)
High temperature accessory for Stem
Specimen holder for high resolution scanning transmission electron microscope enables atomic behaviour of materials at high temperatures to be examined
News from Hitachi High-Technologies ( 9 August 2005)
Sputter profiling for SEM surface analysis
Faraday Plate Imaging package as an optional extra to supplement ion gun component package enables users to identify precisely where the sample is being sputtered
News from Thermo Electron (microanalysis) (18 July 2005)
Probes for scanning electrochemical microscope
Innovative design of the scanning head coupled with the enhanced specifications of the bi-potentiostat has made this the instrument of choice for some of the top research laboratories around the world
News from Trogone Instruments (17 June 2005)
Five-segment BSD for variable pressure SEM
High sensitivity allows smaller spot sizes and beam currents to be used in BSD imaging leading to improved resolution and lower risk of beam damage on delicate, uncoated specimens
News from Hitachi High-Technologies (23 May 2005)
X-ray detector delivers unique thin film analysis
Microbeam X-ray fluorescence metrology systems enable an unprecedented level of analysis for thin film applications in the semiconductor and microelectronics industries
News from Thermo Electron (microanalysis) (20 May 2005)
Laser boosts atom probe power
Technology allows the evaporation, counting, identification and spatial location of individual atoms in a semiconductor sample to produce a three-dimensional visualisation of the atomic arrangement
News from Oxford Nanoscience ( 9 May 2005)
Why use a Stem and not a Tem?
Two new application notes for scanning transmission electron microscopy compare the performance of Stem and Tem instruments, and consider microanalysis with nanometre spatial resolution
News from Hitachi High-Technologies (18 April 2005)
Atom probe is highly sensitive
The extremely narrow peaks produced and high signal-to-noise ratio allow accurate chemical analysis of complex alloys
News from Oxford Nanoscience (18 April 2005)
Breaking electron microscopy resolution barriers
This in-lens scanning electron microscope claims previously unobtainable resolutions of 0.4nm at 30kV and 1.6nm at 1kV
News from Hitachi High-Technologies (10 March 2005)
New head for process development and applications
Peter Clifton joins Oxford Nanoscience from Seagate Technology, where he had been responsible for a variety of sensor development and process development projects
News from Oxford Nanoscience (18 February 2005)
Improved display facilities for VPSEM
The recently-launched S-3400N variable pressure scanning electron microscope from Hitachi High-Technologies has improved display and signal mixing facilities for greater versatility of operation.
News from Hitachi High-Technologies ( 8 February 2005)
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