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Thin film characterisation workshop

An Aquila Instruments product story
Edited by the Laboratorytalk editorial team Aug 12, 2004

Free workshop covers the theory and practice behind thin film measurement as well as a demonstration of the NKD spectrophotometer and an opportunity for sample measurement

On 15 September 2004, Aquila Instruments will be running a workshop day in Duxford, Cambridge.

Aquila has designed a range of instruments to overcome the problems usually encountered when measuring the optical properties of thin-film coatings on transparent, opaque and semi-transparent substrates.

In conventional instruments problems arise from unknown incident polarisation and multiple reflections from the front and back surfaces of the substrate.

Unless the measurement is made at normal incidence, this gives a multitude of transmitted and reflected beams, some of which may escape detection giving inaccurate results.

Aquila's NKD-series spectrophotometers are designed specifically for analysis of thin-film coatings and offer accurate measurement of total transmittance and total reflectance in a precisely defined experimental geometry with known polarisation.

This is used to powerful advantage by the integrated analysis software which can determine the thickness and complex refractive index of a coating from the measured data, says the company.

This one day workshop is designed to provide an overview of this and other spectroscopic techniques, for measuring the characteristics of thin films.

The workshop covers the basic theory behind the nkd system as well as its operation.

There will also be an opportunity for users to bring along their own samples for measurement and analysis on the day.

To reserve a place at the workshop e-mail the company by 3 September 2004, using the link on this page.

Places for the workshop are limited and will be allocated on a first come, first served basis.

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