Product category:
Gas analysis equipment
News Release from: Hiden Analytical | Subject: HPR-30 process gas analyser
Edited by the Laboratorytalk Editorial
Team on 02 February 2007
Gas analyser allows base pressure
fingerprinting
A new monobloc assembly on the Hiden Analytical HPR-30 process gas analyser provides twin conductance paths allowing base pressure measurements and process measurements with the same configuration
Advanced control with auto-switching of the twin inlets via the Massoft operating program enables this dual monitoring role to be completed without user intervention In reactive sputtering applications, for example, the system switches automatically from base pressure fingerprinting and vacuum diagnostics functions to monitoring of the reactive gases at process pressure, with real-time signal output for integration with the operating systems to maintain stable and repeatable processing
This article was originally published on Laboratorytalk on 3 May 2005 at 8.00am (UK)
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Real time analysis of gas and vapour species
Optimised for the specific user process, addressing diverse applications including gas composition and purity measurement, thermogravimetric and catalysis studies, and dissolved species monitoring
The HPR-30 is fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring.
The system features a close-coupled re-entrant aperture for sampling directly within the process region, providing maximum data integrity and fast confirmation of process status.
Options include the innovative Hiden 3F series triple filter quadrupole system providing enhanced abundance sensitivity, part-per-billion(ppb) detection levels and high contamination resistance, particularly suited to the analysis of aggressive gases in CVD and RIE applications.
The analyser, as with all Hiden systems, provides for robust, reliable operation with an easy, bolt-on installation.
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