Product category:
Electron microscopy systems
News Release from: Hitachi High-Technologies | Subject: S-4300SE/N
Edited by the Laboratorytalk Editorial
Team on 13 August 2004
Versatility in microscopy analysis
Instrument claims outstanding analysis capabilities on field emission variable pressure scanning electron microscope
The S-4300SE/N from Hitachi High-Technologies provides a unique combination of a field emission source and variable pressure in a truly analytical instrument The use of a Schottky thermal FE source gives excellent resolution yet also provides sufficient beam current for both EDX and WDX analysis
This article was originally published on Laboratorytalk on 10 Jul 2003 at 8.00am (UK)
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Ultra-high resolution field emission VPSEM
Field emission variable pressure scanning electron microscope combines the high resolution and image quality of a field emission source with the versatility of variable pressure operation
The flexibility of variable pressure operation means that difficult wet, oily and non-conductive specimens can be examined without sample preparation.
The S-4300SE/N offers an unusually large operating pressure range of 10-1000Pa.
For secondary electron images at high pressure, the instrument can be fitted with Hitachi's environmental secondary electron detector.
The instrument can be simultaneously equipped with EDX, WDX, cathodoluminescence and electron backscattered pattern (EBSD), as well as being fitted with beam blanking plates to allow electron beam lithography to be carried out.
This makes the S-4300SE/N one of the most versatile analytical microscopes available.
Excellent elemental analysis is available with the use of both EDX and the latest parallel beam WDS system.
Parallel beam WDS gives improved spectral resolution for the separation of light elements, better spatial resolution for mapping and works well at low kV.
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