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News Release from: Ondax
Edited by the Laboratorytalk Editorial
Team on 18 April 2008
New US patent for Ondax
Patent number US 7,359,046, titled "Method and Apparatus for Wafer-Level Measurement of Volume Holographic Gratings" protects a concept critical to the quality control of VHGs
Ondax has been granted a new patent from the United States Patent and Trademark Office The company now holds nine issued patents and has 20 patent applications pending
This article was originally published on Laboratorytalk on 14 Mar 2008 at 8.00am (UK)
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"This new patent solidifies the protection of our intellectual property portfolio in our core technology of volume holographic gratings and their applications and further strengthens our leadership in this field." said Ondax president and CEO, Christophe Moser.
This patent details an automated method for measuring every parameter of a VHG wafer simultaneously, with a spatial resolution and speed improved by one order of magnitude over current state-of-the-art.
Ondax's solution enables 100% testing on all parameters of the VHG and ensures the highest quality and reproducibility.
Moser went on to say "Ondax customers use our VHGs in very demanding applications.
"It is crucial to get the right performance with every VHG whether used in high volume, consumer applications or low volume, defense applications.".
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