Product category:
General lab equipment
News Release from: Photon Power Technology | Subject: Ipos series
Edited by the Laboratorytalk Editorial
Team on 12 July 2006
New DC magnetron power supplies
One of the latest techniques that the Ipos range are being used for is in VLSI, where the deposition of a copper film into deep hole and trenches is providing designed with improved flexibility
Photon Power Technology has announced the Ipos series of DC magnetron power supplies for sputtering applications Intended for use in industrial vacuum plasma processing, the Ipos series utilises a superior arc suppression technology of typically less that two microseconds for better quality productivity in 'hard-coat' glass/optical coatings
This article was originally published on Laboratorytalk on 21 Mar 2006 at 8.00am (UK)
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Arc energy can be adjusted using the onboard 32bit digital control guaranteeing high accuracy and repeatability and remote control is via the RS232/RS485 interface options.
The Ipos range is available in power levels up to 20kW with various output characteristics dependent upon the wave type required for the magnetron.
All have protection against over voltage, short and open circuit conditions.
The Ipos series are suitable for single and dual magnetron sputtering systems and will also provide DC biasing power.
One of the latest techniques that the Ipos range are being used for is in VLSI, where the deposition of a copper film into deep hole and trenches is providing designed with improved flexibility.
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