NanoCal increases range of thin film analysis
NanoCalc systems utilise spectroscopic reflectometry to determine optical thin film thicknesses for a range of applications.
NanoCalc systems are available for a range of wavelength, sampling method and optical layer thickness requirements (from 1.0 nm to 250 µm).
Users can select among four standard models between ~200-1700 nm and combine them with software, reflection probes, optical fibres and various accessories.
For applications in the Visible (400-850 nm) or UV-Visible (250-1050 nm), users can select preconfigured systems comprising the NanoCalc, a reflection probe and sampling stage, a calibrated Si-SiO2 5-step reference wafer and software that analyses up to 10 optical layers.
For more demanding applications, NanoCalc systems are available with an extensive range of add-on software, optical fibres and metrology accessories such as mapping stages and adapters for microscopes and micro-spot focusing objectives.
- Measurement of anti-reflective and hardness coatings
- Measurement amorphous silicon on solar panels
- Determination of photoresist layers for photomasks
- Testing the optical properties of optical coatings.
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